E4C offers the highest power available from the GEW range, to support the most demanding UV curing applications and the fastest printing speeds. It performs to the harshest cure test procedures and is suitable for Low Migration applications.

E4C has optically tuned reflectors to maximise curing power and operates quietly, with minimal air requirements. An integrated flow switch ensures water flow at all times, and the E4C’s water-cooled reflectors support the highest UV power whilst limiting heat transfer to the substrate, making it safe for a broad range of heat-sensitive materials.

It is designed to operate with the lowest level of maintenance and is engineered for fast, easy lamp changes. All replaceable components are plug-and-play, and the reflectors can be cleaned and fully replaced without breaking the water seals. Furthermore, the reflector mechanisms and seals are tested to millions of operations to ensure reliability.

E4C is also LED-ready: its hybrid lamp casing can house either LED, E2C or E4C arc lamp cassettes. It has a compact profile to fit the widest range of machines and is retrofittable on all E2C installations.

It is also available with multi-point UV monitoring and inert gas curing options.