GEW's Nitro unit with OxyGuard

OxyGuard

OxyGuard is GEW’s next generation oxygen control system. It consists of an innovative new inert gas chamber and revolutionary control software for precision control of oxygen concentration. OxyGuard is ideal for low migration/odour printing, siliconisation and other high performance applications.

OxyGuard inert gas curing

OxyGuard is GEW’s next generation oxygen control system. It consists of an innovative new inert gas chamber and revolutionary control software for precision control of oxygen concentration. OxyGuard is ideal for low migration/odour printing, siliconisation and other high performance applications.

Closed loop control

OxyGuard features a radically improved closed loop control functionality. Oxygen set points are rapidly achieved and maintained to within ~±10%, even with different materials or coatings. Chamber O2 concentration and flow rates are clearly displayed on the HMI. The innovative control ensures no spikes of oxygen concentration, even during rapid machine acceleration. User adjustable warning and error bands are graphically represented on the HMI and can be outputted via digital I/O if levels are exceeded for an adjustable time period.

Job reporting

OxyGuard includes a means of recording live system curing performance data. Oxygen level (ppm), UV intensity and any warning and fault conditions that occur are recorded and timestamped.

For compliance or GMP (e.g. EC Regulation No. 2023/2006), data
can be exported via GEW API for OEM integrations or via an email
report, triggered via the HMI ‘Job logging’ function.

GEW's Nitro unit with OxyGuard

The benefits of OxyGuard

E4C nitrogen unit with OxyGuard
  • Achieves precision oxygen ppm control with custom set points from 30-10,000ppm
  • Closed loop control algorithm rapidly achieves set points and minimises inert gas usage
  • Custom designed chambers support all GEW lamp models and widths, and any quantity of lamps per chamber
  • Chambers can be on rollers, straight through web paths or mounted on conveyors
  • A radically improved user interface makes operator monitoring and adjusting of the curing process easier than ever before
  • Enhanced user-set alarm and warning outputs are available, to enable simple process compliance

Retrofits

Retrofits of OxyGuard control software to existing GEW RHINO/RLT nitrogen systems are possible without changing the physical chamber. This is a quick and easy route to improved process control and lower N2 usage at a reasonable cost.

OxyGuard Front Illustration

Example configuration shown on roller chamber. Many other mechanical configurations are available (e.g. flatbed conveyor).


How it works

Ambient oxygen reduces the effectiveness of UV curing in many inks and coatings. The OxyGuard system overcomes this, by reducing oxygen concentration at the point of curing. A chamber, with inlet and outlet slots, is constructed around the material and an inert gas, usually nitrogen, is pumped in to displace the air and maintain a target oxygen level. A quartz window in the chamber allows the UV lamp to be mounted outside the chamber and shine through to irradiate the ink / coating. Oxygen levels in the chamber are monitored by an oxygen sensor. A closed loop algorithm precisely adjusts the flow of inert gas to the chamber to maintain target oxygen ppm as the material moves through the chamber.

  1. UV lamphead – Compatible with all lamp models and any number of lamps.
  2. Inert gas curing chamber – Available on rollers, straight through web paths or mounted on conveyors.
  3. Inert gas control box – All-electronic control to monitor O2 concentration and regulate inert gas flow.
  4. Oxygen analyser – Compact oxygen sensor mounted near chamber for rapid response.
  5. Inert gas feed – Inert gas feed to control box c/o customer.
  6. HMI touchscreen – GEW UV process control displays oxygen concentration and inert gas flow for each chamber.
  7. RHINO Power Electronics – Ultimate efficiency electronic control is used to power the UV lamp and manage the OxyGuard system.
Inert Gas Curing System Diagram 2025 Update

Specifications

N2 pressure required8 bar
N2 flow requirementContact GEW
N2 purity required99.999%
CompatibilityAny GEW mercury or LED lamp
Sensor calibrationYearly
Set point range30 – 10,000ppm
O2 alarms availableI/O output
ConfigurationRoller or flatbed

Other inert gases can be used, contact GEW for details


Speak to our sales team

Jamie Neill photo

Region, UK:
Jamie Neill
Sales Manager, UK & Ireland

T: +44 7793 042 467

Email Jamie directly

Amir-Dekel, Vice President, Sales at GEW Inc.

Region, Americas:
Amir Dekel
Vice President, Sales

T: +1 440 673 5640

Email Amir directly

Marcus Greenbrook GEW

Region, International:
Marcus Greenbrook
Director, International Sales

T: +44 7764 986 911

Email Marcus directly

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