March 2007. UV systems manufacturer GEW will exhibit its new e-Brick electronic power supply and NUVAplus UV curing lamp head on stand 3-G09 where information on the N2 inert gas atmosphere curing system will also be available.
With energy costs continuing to rise, GEW has developed its new e-Brick electronic power supply to provide a measured reduction of up to 30% in energy costs while giving equivalent curing capability when compared to traditional ballast supplies. The additional benefit of e-Brick is the reduced environmental emissions attendant with lower electrical power use. The e-Brick can be teamed with a range of UV lamp heads in various widths to provide a GEW, e-System UV curing solution for almost every printing and packaging application.
The NUVAplus is an advanced, fully air cooled UV curing system developed for demanding applications such as curing of heavy coatings and cationic inks and varnishes at high press speeds. The system is particularly suited to wide web packaging applications up to 145cm (57”) wide. Reflector design is optimised to provide maximum UV curing on heat-sensitive, extensible substrates.
Increasingly, UV curable inks and varnishes are used for food packaging applications and conventional chemistry can result in unacceptably high levels of odour caused by incomplete cross-linking of the ink film through the presence of oxygen. GEW has developed a simple method of oxygen inerting with its N2 system for silicone release and low odour curing of inks and varnishes.
Head quartered in the United Kingdom, GEW offers complete solutions for curing a wide range of inks and varnishes on today’s substrates. The company serves a worldwide market through a network of distributors and sales and support facilities located in Germany, USA, India and Australasia. ICE 2007, MOC, Munich – GEW Stand Number: 3-GO9, Hall 3.
GEW (EC) Limited
Tel. +44 (0) 1737 824500